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1、Technology for you Technology for you 2 Overview Presentation Hipims+ by Hauzer Why High Power sputter technology Hipims vs. Hipims+ Coatings: TiAlN, Cr2N Machine integration in Flexicoat Technology for you 3 Plasma technology with high % of the material to be deposited is ionized. Gaining control o
2、ver stress - Control microstructure/texture To create defect free coatings with good adhesion. To make coatings for tool and tribo applications which outperform arc deposited coatings To reduce thermal load of substrate To increase deposition rate of sputtering processWhy High power pulse sputtering
3、? Technology for you 4 Capacitor discharge Peak pulse powers from kW to MW Low frequency (duty cycle) Pulse energy and voltage can be defined Pulse shape is determined by system configuration Cabling Pressure Sputtering atmosphere Magnetron designConcept behind HIPIMS Technology Technology for you 5
4、 HIPIMS Plasma composition in ArN2Sum of Ar+Ar+Ti+Ti+N+N+=100% Ratio of N+ to N2+ is significantly higher in a HIPIMS discharge than in (pulsed) DC discharge.More reactive N species. Technology for you 6 HIPIMS TiAlN Experiment Experiment overview Sample : polished M2 HSSTarget : 50/50 at% AlTiDep.
5、Temp. : 450-520oCFilm thickness : 2-3mFull load in chamber, Three fold rotationSample # Etching Deposition source configuration Bias voltage1 Spu HIPIMS Ti 2 DC + 1HIPIMS -75V2 Spu HIPIMS Ti 2 DC + 1HIPIMS -95V3 Spu HIPIMS AlTi 1 DC + 2 HIPIMS -75V1 Arc Arc Ti 2 x 4 CARC -40V2 Arc Arc Ti 2 x 4 CARC
6、-70V Technology for you 72D1H95HIPIMS -95V bias2D1H75HIPIMS -75V biasA70Arc -70V bias Results - RoughnessAFM 30 x30m Significant improvement in surface roughness Technology for you 8 Results - RoughnessRoughness data Technology for you 9 Ion energy 2D1H75VHIPIMS -75V 2D1H95HIPIMS -95VResults - Morph
7、ologyAFM 2x2mIncrease in ion energy (higher bias) with constant ion flux leads to densification of coatingColumns coalesce to reduce number of boundariesResputtering of film evident at growing surface Technology for you 10 Results Hardness and E modulus Hardness increases with increasing bias or add
8、ition of HIPIMS Cathodes.No definite trend for E modulus possible differences due to changes in Microstructure. Technology for you 11 Results Scratch test AlTi etchedTi etched Critical loads for HIPIMS etched samples close to those for arc etched Samples.No apparent difference In adhesion with respe
9、ct to etching material. Technology for you 12 Conclusions HIPIMS TiAlNIt is possible to create AlTiN coatings by HIPIMS deposition with material properties similar to those deposited by cathodic arcsimilar hardness and E modulus.HIPIMS deposited coatings show some promising benefits as compared to a
10、rc deposited coatingslower roughnessHIPIMS etching produces comparable adhesion values as compared to metal ion etching from an arc source for both Ti and AlTi targets.HIPIMS technology is industrially feasible. Technology for you 13 Modulated Pulse Power - MPP High power pulse magnetron sputtering
11、technique Heart of technology is Multi-step DC pulse Voltage rise time control is key to enabling a long, stable, and high power pulse discharge Pulses widths of 200 sec up to 1.5 msec HIPIMS+ by Hauzer provides: Control of the gas to metal ion ratio Increased deposition rate (higher than HIPIMS) Im
12、proved target utilization Smooth, very good adhering hard coatings for tool and tribo applications.Hipims+ Technology Integrated MPP Technology Technology for you 14 HIPIMS vs. HIPIMS+ HIPIMS HIPIMS+ Peak power 8MW 360kW Voltage 2000V 800V Current 4000A 600A Maximum pulse length 200s 3000s Maximum f
13、requency 500Hz 1000Hz Maximum average power output 20kW 20kW Arc detection 500ns 800ns Pulse shape programming no yes Technology for you 15 Integrated MPP Technology - Modulated Pulse Power Multi-step voltage pulse First step ignition of low power discharge Second step low power discharge Third step
14、 transient stage from low power discharge to high power discharge Fourth step high power dischargeHIPIMS+ TechnologyVV LPVHP 1 2 3 40 t0 t1 t2 t3 t4(1) VLP/(t1-t0) (3) (VHP-VLP)/(t3-t2)timet5 Technology for you 16 Hipims+ Pulse Technology for you 17 Hipims+ Pulsing possibilities Multilayer structure
15、 of CrN film, sputtered with different voltage pulse shapes (1) and (2).Time T1 (5s, 10s, 15s) Rep. rate 160 H z Time T2 (5s, 10s, 15s) Rep. rate 50 H zV Si Time1500 s 1500 s700 s 700 s 150 ms600540 1 1 2 2 Technology for you 18 Provide an additional constant voltage power supply, which can supply t
16、he required peak current at the required constant voltage. (Arc handling) Simple Solution: use capacitor as additional CV-power supply. Hauzer Patent: electronic switching for a fast interruption of the arc current, capable to handle the current of the capacitor discharge circuit. With capacitor 80
17、AWithout capacitor Hipims+ Bias issues Technology for you 19Hipims+ Hipims+Flexicoat 1000 Table dia = 650mmCoating zone height = 650mmFull loadCoating temperature = 520CTarget composition 50/50 at%Ti+ etching CARC cathodesAr+ etching plasma sourceHIPIMS+ TiAlN Technology for you 20 Ti+ ion etching (
18、arc) + DC sputterTi+ ion etching (arc) + ArcTi+ ion etching (arc) + HIPIMS+Ar+ etching + HIPIMS+HIPIMS+ TiAlN experiment overview Technology for you 21 HIPIMS+ Scratch summaryArc etch + UBMArc etch + HIPIMS + Arc etch + ArcAr etch + HIPIMS+ 80N 100N100N 100NHVPL (20mN) 3415 S = 4.08 m Ra = 0.050 mHV
19、PL (20mN) 3311S = 3.52 m Ra = 0.143 m HVPL (20mN) 3150S = 2.75 m Ra = 0.143 mHVPL (20mN) 2874S = 4.00 m Ra = 0.101 m Technology for you 22 TiAlN Deposition rate normalized to one bank (4xCARC) of arc sourcesAverage power for UBM and Hipims+ = 10kW Technology for you 23 TiAlN HIPIMS+ conclusions Dens
20、e coatings with dense microstructure similar to arc coatings can be produced with HIPIMS+ technology. Adhesion is comparable to arc coatings (Argon etching and HIPIMS+ for coating). Ra value 2 to 3 times better than Arc (smooth coating) Comparable deposition rate to arc (14 kW). Coating has been fou
21、nd to outperform OEM benchmark for stainless milling by 30%. Technology for you 24 HIPIMS+ Cr2N Harder and more wear resistant than CrN Has better oil wettability than CrN lower friction Tool Moulding dies Forming tools Low temperature coatings 250C Temperature sensitive steels Plastics Aim of Hipim
22、s + coatings Lower temperature deposition less thermal loading More control over stress and microstructure No post treatment needed as compared to arc coatings Technology for you 25 HIPIMS+ Cr2N Microstructure Technology for you 26 Hardness vs Peak Power Density Technology for you 27 Cr2N Comparison
23、 of Hipims+ and closed field UBM sputtering I bias-ave (A) Deposition rate (m/hr)HIPIMS+ (208 W/cm2) 3,7 0,87DC (closed field configuration) 12 0,67Thermal loading with Hipims + technology is lower than for DC can have higher deposition rate with Hipims+Target utilization is poor for high UBM coil c
24、urrentsFull face erosion with HIPIMS+ depositionTsubstrate =250C Technology for you 28 Conclusions Cr2N HIPIMS+ Relatively low loss of deposition rate as peak power density increases. Low temperature coating can be deposited. Eliminate post treatment after coating. Suspect that increase in metal ion
25、/neutral ratio is responsible for refinement of microstructure at constant bias voltage It is possible to tailor film stress. Technology for you 29 Industrial requirements Technology for you 30 Conclusions HIPIMS+ technology is available and has been integrated into Hauzer Flexicoat 1000 and Flexico
26、at 850. Hauzer is currently developing HIPIMS+ technology as an industrial solution for producing superior hard coatings. As a result of the increased ionization in the HIPIMS+ process, the process window is wide for deposition of hard coatings, such as TiAlN and CrN. Even at low deposition temperat
27、ures, industrially viable coatings can be produced. HIPIMS+ technology can be used for commercial applications, such as Cr 2N. For such an application, it has been found that that the coating time for such a coating can be reduced by 33% due to reduced thermal loading. HIPIMS+ deposited TiAlN has outperformed a major OEM benchmark for stainless steel milling. HIPIMS+ technology is commercialy available for the Flexicoat 850, 1000 and 1200 machines. Technology for you Hauzer Techno Coating (HQ Venlo NL)Thank you for your attention
HIPIMS,HIPIMS+ 大功率脈沖磁控濺射課件.ppt
